Compressively strained epitaxial Ge layers for quantum computing applications
Y. Shimura, C. Godfrin, A. Hikavyy, R. Li, J.L. Aguilera Servin, G. Katsaros, P. Favia, H. Han, D. Wan, K. de Greve, R. Loo, Materials Science in Semiconductor Processing 174 (2024).
LibreCat: https://research-explorer.ista.ac.at/record/15018
DOI: 10.1016/j.mssp.2024.108231