{"month":"01","publication":"Physical Review X","citation":{"ista":"Mongillo M, Spathis P, Katsaros G, De Franceschi S, Gentile P, Rurali R, Cartoixà X. 2014. PtSi clustering in silicon probed by transport spectroscopy. Physical Review X. 3(4).","mla":"Mongillo, Massimo, et al. “PtSi Clustering in Silicon Probed by Transport Spectroscopy.” Physical Review X, vol. 3, no. 4, American Physical Society, 2014, doi:10.1103/PhysRevX.3.041025.","apa":"Mongillo, M., Spathis, P., Katsaros, G., De Franceschi, S., Gentile, P., Rurali, R., & Cartoixà, X. (2014). PtSi clustering in silicon probed by transport spectroscopy. Physical Review X. American Physical Society. https://doi.org/10.1103/PhysRevX.3.041025","chicago":"Mongillo, Massimo, Panayotis Spathis, Georgios Katsaros, Silvano De Franceschi, Pascal Gentile, Riccardo Rurali, and Xavier Cartoixà. “PtSi Clustering in Silicon Probed by Transport Spectroscopy.” Physical Review X. American Physical Society, 2014. https://doi.org/10.1103/PhysRevX.3.041025.","ama":"Mongillo M, Spathis P, Katsaros G, et al. PtSi clustering in silicon probed by transport spectroscopy. Physical Review X. 2014;3(4). doi:10.1103/PhysRevX.3.041025","short":"M. Mongillo, P. Spathis, G. Katsaros, S. De Franceschi, P. Gentile, R. Rurali, X. Cartoixà, Physical Review X 3 (2014).","ieee":"M. Mongillo et al., “PtSi clustering in silicon probed by transport spectroscopy,” Physical Review X, vol. 3, no. 4. American Physical Society, 2014."},"publisher":"American Physical Society","volume":3,"extern":1,"main_file_link":[{"url":"http://arxiv.org/abs/1407.5413","open_access":"1"}],"publication_status":"published","type":"journal_article","publist_id":"5363","acknowledgement":"This work was supported by the Agence Nationale de la Recherche and by the EU through the ERC Starting Grant HybridNano","date_published":"2014-01-01T00:00:00Z","status":"public","oa":1,"abstract":[{"text":"Metal silicides formed by means of thermal annealing processes are employed as contact materials in microelectronics. Control of the structure of silicide/silicon interfaces becomes a critical issue when the characteristic size of the device is reduced below a few tens of nanometers. Here, we report on silicide clustering occurring within the channel of PtSi/Si/PtSi Schottky-barrier transistors. This phenomenon is investigated through atomistic simulations and low-temperature resonant-tunneling spectroscopy. Our results provide evidence for the segregation of a PtSi cluster with a diameter of a few nanometers from the silicide contact. The cluster acts as a metallic quantum dot giving rise to distinct signatures of quantum transport through its discrete energy states.","lang":"eng"}],"title":"PtSi clustering in silicon probed by transport spectroscopy","date_created":"2018-12-11T11:53:52Z","date_updated":"2021-01-12T06:53:02Z","author":[{"last_name":"Mongillo","first_name":"Massimo","full_name":"Mongillo, Massimo"},{"last_name":"Spathis","first_name":"Panayotis","full_name":"Spathis, Panayotis N"},{"full_name":"Georgios Katsaros","last_name":"Katsaros","id":"38DB5788-F248-11E8-B48F-1D18A9856A87","first_name":"Georgios"},{"last_name":"De Franceschi","first_name":"Silvano","full_name":"De Franceschi, Silvano"},{"first_name":"Pascal","last_name":"Gentile","full_name":"Gentile, Pascal"},{"full_name":"Rurali, Riccardo","last_name":"Rurali","first_name":"Riccardo"},{"first_name":"Xavier","last_name":"Cartoixà","full_name":"Cartoixà, Xavier"}],"intvolume":" 3","quality_controlled":0,"doi":"10.1103/PhysRevX.3.041025","day":"01","year":"2014","_id":"1761","issue":"4"}