A duality between surface charge and work function in scanning Kelvin probe microscopy

Lenton IC, Pertl F, Shafeek LB, Waitukaitis SR. 2025. A duality between surface charge and work function in scanning Kelvin probe microscopy. Advanced Materials Interfaces.

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Corresponding author has ISTA affiliation

Abstract
Scanning Kelvin probe microscopy (SKPM) is a powerful technique for macroscopic imaging of the electrostatic potential above a surface. Though most often used to image work-function variations of conductive surfaces, it can also be used to probe the surface charge on insulating surfaces. In both cases, relating the measured potential to the underlying signal is non-trivial. Here, general relationships are derived between the measured SKPM voltage and the underlying source, revealing either can be cast as a convolution with an appropriately scaled point spread function (PSF). For charge that exists on a thin insulating layer above a conductor, the PSF has the same shape as what would occur from a work-function variation alone, differing by a simple scaling factor. This relationship is confirmed by: (1) backing it out from finite-element simulations of work-function and charge signals, and (2) experimentally comparing the measured PSF from a small work-function target to that from a small charge spot. This scaling factor is further validated by comparing SKPM charge measurements with Faraday cup measurements for highly charged samples from contact-charging experiments. These results highlight a heretofore unappreciated connection between SKPM voltage and charge signals, offering a rigorous recipe to extract either from experimental data.
Publishing Year
Date Published
2025-08-29
Journal Title
Advanced Materials Interfaces
Publisher
Wiley
Acknowledgement
This project received funding from the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation programme (Grant agreement No. 949120). This research was supported by the Scientific Service Units of The Institute of Science and Technology Austria (ISTA) through resources provided by the Miba Machine Shop, Nanofabrication Facility, Scientific Computing Facility, and Lab Support Facility. The authors wish to thank Dmytro Rak and Juan Carlos Sobarzo for letting us use their equipment. The authors wish to thank Evgeniia Volobueva for advice in preparing PFIB samples. The authors wish to thank the contributions of the whole Waitukaitis group for useful discussions and feedback.
eISSN
IST-REx-ID

Cite this

Lenton IC, Pertl F, Shafeek LB, Waitukaitis SR. A duality between surface charge and work function in scanning Kelvin probe microscopy. Advanced Materials Interfaces. 2025. doi:10.1002/admi.202500521
Lenton, I. C., Pertl, F., Shafeek, L. B., & Waitukaitis, S. R. (2025). A duality between surface charge and work function in scanning Kelvin probe microscopy. Advanced Materials Interfaces. Wiley. https://doi.org/10.1002/admi.202500521
Lenton, Isaac C, Felix Pertl, Lubuna B Shafeek, and Scott R Waitukaitis. “A Duality between Surface Charge and Work Function in Scanning Kelvin Probe Microscopy.” Advanced Materials Interfaces. Wiley, 2025. https://doi.org/10.1002/admi.202500521.
I. C. Lenton, F. Pertl, L. B. Shafeek, and S. R. Waitukaitis, “A duality between surface charge and work function in scanning Kelvin probe microscopy,” Advanced Materials Interfaces. Wiley, 2025.
Lenton IC, Pertl F, Shafeek LB, Waitukaitis SR. 2025. A duality between surface charge and work function in scanning Kelvin probe microscopy. Advanced Materials Interfaces.
Lenton, Isaac C., et al. “A Duality between Surface Charge and Work Function in Scanning Kelvin Probe Microscopy.” Advanced Materials Interfaces, Wiley, 2025, doi:10.1002/admi.202500521.
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arXiv 2506.07187

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